Cicek, HikmetAcar, Yunus EmreDuran, SemihYilmaz, Ahmet MelikCakir, Muhammet2026-03-262026-03-2620230040-60901879-273110.1016/j.tsf.2023.1400592-s2.0-85171355368https://doi.org/10.1016/j.tsf.2023.140059https://hdl.handle.net/20.500.14901/2871Duran, Semih/0000-0001-7107-1461; Çiçek, Hikmet/0000-0003-3038-4466;TiSiN thin films were deposited on 52100 steel and Al2024 substrates by magnetron sputtering method using Ti and Si targets in Ar+N2 atmosphere. Power values of 40 W, 60 W, and 75 W were applied to the Si target, while the voltage was constant at 370 V for the Ti target. The Si atomic ratios within the film's structure were found to vary in accordance with the increasing Si target power. The impact of varying Si atomic ratios on the structural, mechanical, and tribological properties of the films was investigated. X-ray diffraction, scanning electron mi-croscopy, hardness and wear test methods were performed. As the Si ratio increased from 10 at. % to 20 at. %, the maximum hardness value was 6.06 GPa for 52100 steel and 4.33 GPa for Al2024. With increasing Si content, the film thickness increased from 1.63 mu m to 2.05 mu m. The lowest surface roughness of the produced films was 0.069 for 52100 steel and 0.308 for Al2024. The lowest wear rate of TiSiN film was calculated at 1.63 x 10-4 mm3/(N.m).eninfo:eu-repo/semantics/closedAccessTitanium Silicon NitrideTribologyWear Magnetron SputteringArticle