Deposition of ZnO Thin Films by RF&DC Magnetron Sputtering on Silicon and Porous-Silicon Substrates for Pyroelectric Applications

Abstract

In this study, the temperature response of ZnO thin film is investigated in an attempt to enhance its pyroelectric performance. The film is formed on PS and Si substrates utilizing RF&DC magnetron sputtering deposition technique. The outcome of study reveals a pyroelectric coefficient observed from ZnO film on PS which is 40 times higher than that on Si and a pyroelectric voltage as high as 2.4V due to PS's profound effect on film formation, large surface to volume area and low thermal conductivity. Thus, this study can lead the way to a robust, reliable and more efficient pyroelectric operation of ZnO with employment of PS structure. (C) 2017 Elsevier B.V. All rights reserved.